Double target magnetron coater introduction:
Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.
Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.
In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory

Double target magnetron coater technical parameters:
Item Detail
Voltage AC220V,50Hz
Power 3KW
Ultimate vacuum 10-6 torr
Sample carrier
Size:φ140mm
Heating temperature:MAX.500ºC
Accuracy:±1ºC
Speed:1~20rpm adjustable
Magnetron sputtering head
Number: two ,2-inch
Cooling mode:Water cooling,10L / min flow rate
Vacuum Chamber
Size:φ300mm × 300mm H
Material:stainless steel
Observation window:φ100mm
Opening mode:Open top, easy to replace the target
Gas flow controller 2 ways: Ar, N2;Range 0-100sccm
Vacuum pump Molecular pump system, pumping speed: 600L/S
Film thickness gauge Quartz vibrating film thickness gauge , resolution: 0.10 μ M
Sputtering power supply
One DC power supply, 1000W, suitable for preparing metal film
One RF power supply, 500W, suitable for non-metallic coating
Operation mode Panel button operation
Dimensions 1400mm × 750mm × 1300mm
Weight 300 KG