150W DC Magnetrons Sputtering Power Supply Small Coater for Metal Sputter Coating
Mini magnetron sputtering coating machine introduction: Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron targe...
Mini magnetron sputtering coating machine introduction:
Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W DC power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Mini magnetron sputtering coating machine application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Mini magnetron sputtering coating machine technical parameters:
Sample stage Size φ138mm Temperature control accuracy ±1ºC
Heating temperature Max 500ºC Rotate speed 1-20rpm adjustable
Magnetron Sputtering target head Quantity 2"×1 (1",2" optional) Water chiller Circulating water chiller with flow rate of 10L/min
Cooling mode Water cooling
Vacuum chamber Chamber size φ180mm×215mm Watch window Omnidirectional transparent
Chamber material High purity quartz Opening mode Top cover removable
Vacuum system Model CY-GZK103-A Pumping interface KF40
Molecular pump CY-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration Quantity DC power supply x1 Max output power 150W
Other parameters Supply voltage AC220V,50Hz Overall size 500mm×350mm×400mm
Total power 1.7KW (Vacuum pump1.5KW+machine0.2KW) Total Weight About 30kg
Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated. The device is equipped with 150W DC power supply, which can be used for metal sputter coating. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Mini magnetron sputtering coating machine application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Mini magnetron sputtering coating machine technical parameters:
Sample stage Size φ138mm Temperature control accuracy ±1ºC
Heating temperature Max 500ºC Rotate speed 1-20rpm adjustable
Magnetron Sputtering target head Quantity 2"×1 (1",2" optional) Water chiller Circulating water chiller with flow rate of 10L/min
Cooling mode Water cooling
Vacuum chamber Chamber size φ180mm×215mm Watch window Omnidirectional transparent
Chamber material High purity quartz Opening mode Top cover removable
Vacuum system Model CY-GZK103-A Pumping interface KF40
Molecular pump CY-600 Exhaust interface KF16
Backing pump rotary vane pump Vacuum measurement Compound vacuum gauge
Ultimate vacuum 1.0E-5Pa Power supply AC;220V 50/60Hz
Pumping rate Molecular pump: 600L/S rotary vane pump: 1.1L/S
Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration Quantity DC power supply x1 Max output power 150W
Other parameters Supply voltage AC220V,50Hz Overall size 500mm×350mm×400mm
Total power 1.7KW (Vacuum pump1.5KW+machine0.2KW) Total Weight About 30kg
| Attribute name | Attribute value |
|---|---|
| Product Features | |
| Color | Silver |
| Performance | customizable, Automatic, Perfect, easy operation, cost-effective, multi-function, Small volume, Size optional, high-precision |
| Installation, Training and Setting-up | Ready to provide advice on installation if needed, The buyer installs with the help of the manual |
| Standards | Customized according to required standards, Customized with the best quality, ISO 7500, CE |
| After sales services | Lifetime |
| Warranty | 1 Year |