350 Type Four-Source Organic-Inorganic Thermal Evaporation Coating System for Nano-Scale Single Layer and Multilayer Film Preparation
Product description of 350 type four-source organic-inorganic thermal evaporation coating system: It mainly consists of vacuum chamber system evaporation chamber, evaporation source system, sample stage system, vacuum pumping and measuring system, pneumatic system, control system, film thickness tes...
Product description of 350 type four-source organic-inorganic thermal evaporation coating system:
It mainly consists of vacuum chamber system evaporation chamber, evaporation source system, sample stage system, vacuum pumping and measuring system, pneumatic system, control system, film thickness test system, upper cover hydraulic opening mechanism and electronic control system.
Application of 350 type four-source organic-inorganic thermal evaporation coating system:
It is used for the preparation of novel thin film materials such as nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films and dielectric films. It is widely used in the research and small batch preparation of thin film materials in universities and research institutes.
Technical specifications of 350 type four-source organic-inorganic thermal evaporation coating system:
Ultimate vacuum 5*10-5Pa
Recovery vacuum time 6.6×10 Pa in 40 minutes (short-time exposure to the atmosphere and filling with dry nitrogen to start pumping)
System leakage rate 1*10-7PaL/S
Vacuum chamber circular vacuum chamber, size 300 × 350mm
Sample stage a flat sample measuring 3 inches by 3 inches and having a thickness of 3.2 mm;
Metal electrode: quantity: 1 piece, standard type brazed indirect water-cooled structure; diameter Φ20mm, internal water cooling. Evaporate upward into a film;
Organic beam source furnace quantity: 3, standard type 600 degree temperature control, evaporation to film;
Sample holder Place the sample holder on the substrate turntable with one substrate position (the sample holder can be placed 2 inches separately) to install the furnace.
Substrate In order to increase film thickness uniformity over a 2-inch substrate stage, the substrate is rotated at the coating position.
The temperature of the substrate is from room temperature to 600 ° C (the temperature of the upper surface of the silicon wafer, only need to be calibrated once)
4 sets of baffle system substrate baffle and source baffle; 3 sets of target baffles, manual control of dynamic seal; sample baffle (1 set), magnetic fork,
Manual control gas system mass flow controller 1 way
Mass flow controller 1 way film thickness measurement range 0-999999Å
Pump Optional molecular pump set or cryopump combined vortex dry pump pumping system
It mainly consists of vacuum chamber system evaporation chamber, evaporation source system, sample stage system, vacuum pumping and measuring system, pneumatic system, control system, film thickness test system, upper cover hydraulic opening mechanism and electronic control system.
Application of 350 type four-source organic-inorganic thermal evaporation coating system:
It is used for the preparation of novel thin film materials such as nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films and dielectric films. It is widely used in the research and small batch preparation of thin film materials in universities and research institutes.
Technical specifications of 350 type four-source organic-inorganic thermal evaporation coating system:
Ultimate vacuum 5*10-5Pa
Recovery vacuum time 6.6×10 Pa in 40 minutes (short-time exposure to the atmosphere and filling with dry nitrogen to start pumping)
System leakage rate 1*10-7PaL/S
Vacuum chamber circular vacuum chamber, size 300 × 350mm
Sample stage a flat sample measuring 3 inches by 3 inches and having a thickness of 3.2 mm;
Metal electrode: quantity: 1 piece, standard type brazed indirect water-cooled structure; diameter Φ20mm, internal water cooling. Evaporate upward into a film;
Organic beam source furnace quantity: 3, standard type 600 degree temperature control, evaporation to film;
Sample holder Place the sample holder on the substrate turntable with one substrate position (the sample holder can be placed 2 inches separately) to install the furnace.
Substrate In order to increase film thickness uniformity over a 2-inch substrate stage, the substrate is rotated at the coating position.
The temperature of the substrate is from room temperature to 600 ° C (the temperature of the upper surface of the silicon wafer, only need to be calibrated once)
4 sets of baffle system substrate baffle and source baffle; 3 sets of target baffles, manual control of dynamic seal; sample baffle (1 set), magnetic fork,
Manual control gas system mass flow controller 1 way
Mass flow controller 1 way film thickness measurement range 0-999999Å
Pump Optional molecular pump set or cryopump combined vortex dry pump pumping system
| Attribute name | Attribute value |
|---|---|
| Product Features | |
| Color | Gold, Silver, Golden gray, Black |
| Performance | customizable, Automatic, multi-function |
| Installation, Training and Setting-up | Ready to provide advice on installation if needed, The buyer installs with the help of the manual |
| Standards | Customized according to required standards, Customized with the best quality, CE |
| After sales services | Lifetime |
| Warranty | 1 Year |