Brief Introduction of Spin Coater with air purifier:
Spin Coater with air purifier is widely used in the homogenous film coating of semiconductor silicon wafers, for example, when making large-scale wafers, chips, wafers, etc. for process plate-making, this equipment can be used for surface coating of various colloids or photolithography process;
It is a special equipment for coating uniform glue in the production process of integrated circuits and semiconductor devices. The gluing part of the equipment contains two stations of glue leveling table, which can work independently or simultaneously.

Features of Spin Coater with air purifier:
1.100 grade purifying effect, can remove the dust to avoid coating sample from pollution

2.Equipped with LED lighting with programmable control, easy operate

3.Time-coating programmable control

4.LCD 7" touch panel, simple and easy operate.

Technical parameter of Spin Coater with air purifier:
Model No. CY-GKF411
Coating time 1-99S
Time accuracy ±5%
Coating speed 0-8000RPM
Speed accuracy ±3%
Working station Two station
Purifying Effect 100 grade(USA Federal Standard)
Operating area wind speed 0.3-0.5m/s
Wafer dimension 10mm-100mm wafer or other material
System control PID Programmable control
Outer dimension 800x680x1700mm