Product description of ZF450 multi-source evaporation:
It mainly consists of vacuum chamber system evaporation chamber, evaporation source system, sample stage system, vacuum pumping and measuring system, pneumatic system, control system, film thickness test system, upper cover hydraulic opening mechanism and electronic control system.

Application of ZF450 multi-source evaporation:
It is used for the preparation of novel thin film materials such as nano-scale single-layer and multi-layer functional films, hard films, metal films, semiconductor films and dielectric films. It is widely used in the research and small batch preparation of thin film materials in universities and research institutes.

Technical specifications of ZF450 multi-source evaporation:
Ultimate vacuum 5*10-5Pa
Recovery vacuum time 6.6 × 10 Pa in 40 minutes (smoke after a short exposure to the atmosphere and dry nitrogen)
System leakage rate 1*10-7PaL / S
Vacuum chamber circular vacuum chamber, size 300 * 350mm
Sample stage a flat sample measuring 3 inches by 3 inches and having a thickness of 3.2 mm;
Metal electrode quantity: 1 piece, standard type brazed indirect water-cooled structure; diameter Φ20mm, internal water cooling. Evaporate upward into a film;
Organic beam source furnace quantity: 3, standard type 600 degree temperature control, evaporation to film;
Sample holder Place the sample holder on the substrate turntable with one substrate position (the sample holder can be placed 2 inches separately) to install the furnace. In order to increase film thickness uniformity over a 2-inch substrate stage, the substrate is rotated at the coating position. The temperature of the substrate is from room temperature to 600 ° C (the temperature of the upper surface of the silicon wafer, only need to be calibrated once)
4 sets of baffle system substrate baffle and source baffle; 3 sets of target baffles, manual control of dynamic seal; sample baffle (1 set), magnetic fork,
Manual control Pneumatic system mass flow controller 1 way
Quartz crystal film thickness controller film thickness measurement range 0-999999Å
Pump Optional molecular pump set or cryopump combined vortex dry pump pumping system