This equipment is a desktop single sputter head magnetron sputtering coating machine. The miniaturized design of the equipment limits the appearance of the equipment to the desktop level, greatly reducing the installation site requirements. The equipment is equipped with a DC power supply, which can be used for sputtering metal materials and has the characteristics of fast speed and low temperature rise.
Technical parameters:
Sample stage Size φ100mm
Heating Max. 500℃
Rotating speed 0-20rpm adjustable
Magnetron sputtering head Quantity 2" x1
Vacuum chamber Chamber size φ180mm x 215mm
Observation window Omnidirectional transparent
Chamber material High purity quartz
Open method Upper cover removable
Vacuum system Mechanical pump Rotary vane pump
Pumping port KF16
Exhaust interface KF16
Molecular pump Turbomolecular pump
Pumping port KF40
Exhaust interface KF40
Vacuum measurement Resistance gauge + ionization gauge
Ultimate vacuum 1.0E-4Pa
Power supply AC 220V 50/60Hz
Pumping rate Mechanical pump 1.1L/s Molecular pump 600L/s
Power configuration Quantity DC power supply x1
Max. output power DC power supply 150W
Supply voltage AC220V, 50Hz
Others Total power 2kW
Overall size 550mm x 350mm x 400mm