Watch Vacuum Plasma Coating Machine with 2 Inch*2 Standard Size Sputtering Target
Product name: small double target plasma sputtering coating machine with a rotatable heating sample stage Introduction: This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-tem...
Product name: small double target plasma sputtering coating machine with a rotatable heating sample stage
Introduction:
This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. (This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.) This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.
Application
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
Technical parameters:
Sample stage Size 100mm
Rotating speed 1~20rpm adjustable
Heating temperature ≤500ºC
Temperature control accuracy ±1ºC PID temperature control
Plasma sputtering source Quantity 2 inches x2
Cooling method Water cooling
Vacuum chamber Chamber size φ180mm x 210mm
Observation window Omnidirectional visibility
Chamber material High purity quartz
Open method Top cover removable
Upper and lower cover material 304 stainless steel
Pumping port KF16
Intake port 1/4 inch ferrule connector
Power configuration Quantity DC power supplyx1
Output power Max. 150W
Sputtering power 1200V
Max. sputtering current 50mA
Vacuum system Vacuum pump type Dual-stage rotary vane vacuum pump
Pumping port KF16
Exhaust interface KF16
Pumping rate 1.1L/s(4m3/h)
Ultimate vacuum ≥0.1Pa
Vacuum measurement Resistance vacuum gauge
Others Power supply AC 220V 50Hz
Total power 2kW
Dimension 500mm x 320mm x470mm
Weight 30kg
Introduction:
This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This model machine is also equipped with a rotatable sample stage, which can effectively improve the uniformity of the coating. (This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film.) This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.
Application
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.
Technical parameters:
Sample stage Size 100mm
Rotating speed 1~20rpm adjustable
Heating temperature ≤500ºC
Temperature control accuracy ±1ºC PID temperature control
Plasma sputtering source Quantity 2 inches x2
Cooling method Water cooling
Vacuum chamber Chamber size φ180mm x 210mm
Observation window Omnidirectional visibility
Chamber material High purity quartz
Open method Top cover removable
Upper and lower cover material 304 stainless steel
Pumping port KF16
Intake port 1/4 inch ferrule connector
Power configuration Quantity DC power supplyx1
Output power Max. 150W
Sputtering power 1200V
Max. sputtering current 50mA
Vacuum system Vacuum pump type Dual-stage rotary vane vacuum pump
Pumping port KF16
Exhaust interface KF16
Pumping rate 1.1L/s(4m3/h)
Ultimate vacuum ≥0.1Pa
Vacuum measurement Resistance vacuum gauge
Others Power supply AC 220V 50Hz
Total power 2kW
Dimension 500mm x 320mm x470mm
Weight 30kg