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    44191
    Zhengzhou CY Technology Instrument Co., Ltd.
    Atomic Layer Deposition System for Industrial Large-Scale Production with Four Chambers
    (65)
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    44190
    Zhengzhou CY Technology Instrument Co., Ltd.
    Highly integrated atomic layer deposition(ALD) system with four chambers for the production of nanostructured films
    (65)
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    44189
    Zhengzhou CY Technology Instrument Co., Ltd.
    Fully Automatic Production Type Single Cavity Atomic Layer Deposition System
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    44188
    Zhengzhou CY Technology Instrument Co., Ltd.
    ALD Atomic Layer Deposition System for deposition of Single substance, nitride, oxide, other compound film
    (65)
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    44187
    Zhengzhou CY Technology Instrument Co., Ltd.
    Plasma Enhance Atomic Layer Deposition System (PEALD) Single-Wafer Deposition System
    (65)
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    44186
    Zhengzhou CY Technology Instrument Co., Ltd.
    Plasma Enhance Atomic Layer Deposition System (PEALD) Single-Wafer Deposition System
    (65)
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    44185
    Zhengzhou CY Technology Instrument Co., Ltd.
    Multi-Piece Plasma Enhanced Atomic Layer Deposition System for The Deposition of Thin Films of Temperature-Sensitive Materials
    (65)
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    44184
    Zhengzhou CY Technology Instrument Co., Ltd.
    Thermal Atomic Layer Single-Wafer Deposition System for Micro-Electronic, Nano Material, Optical Film, Solar Battery
    (65)
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    44183
    Zhengzhou CY Technology Instrument Co., Ltd.
    Heating (T-ALD) Atomic Layer Deposition System Tald Thermal Atomic Layer Deposition System
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    44182
    Zhengzhou CY Technology Instrument Co., Ltd.
    Single Chamber Type Atomic Layer Deposition System (ALD) for The Preparation of Conventional Oxide Films
    (65)
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    44181
    Zhengzhou CY Technology Instrument Co., Ltd.
    Atomic Layer Deposition System (ALD) with Double Cavity for Solar Cells, Optical Films, Nano Films
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    44180
    Zhengzhou CY Technology Instrument Co., Ltd.
    500W Plasma Atomic Layer System Used in Thin Film Semiconductor Material Preparation System
    (65)
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